International Journal of Application or Innovation in Engineering & Management
An Inspiration for Recent Innovation & Research….
ISSN 2319 – 4847
www.ijaiem.org

Call for Paper, Published Articles, Indexing Infromation Preparation and study of Cu2O thin film at low temperature by Chemical vapor deposition (CVD) route, Authors : Mahmood M. Kareem, Anwar H. Ali Al-Fouadi, Dhia H. Hussain, International Journal of Application or Innovation in Engineering & Management (IJAIEM), www.ijaiem.org
Volume & Issue no: Volume 4, Issue 12, December 2015

Title:
Preparation and study of Cu2O thin film at low temperature by Chemical vapor deposition (CVD) route
Author Name:
Mahmood M. Kareem, Anwar H. Ali Al-Fouadi, Dhia H. Hussain
Abstract:
ABSTRACT In this study cuprous oxide (Cu2O) nanoparticle has been synthesized at low temperature of 200oC by chemical vapor deposition (CVD) route. The complex compound Cu (acac)2 was used as precursor sublimated at temperature of 275oC and deposited over a glass substrates. The synthesized films have been characterized by using X-ray diffraction (XRD) analysis, field emission electron microscope (FE-SEM), atomic force microscopy (AFM) and transmission electron microscope (TEM) analysis. Keywords: Cu2O nanostructures, CVD, AFM, FE-SEM, TEM.
Cite this article:
Mahmood M. Kareem, Anwar H. Ali Al-Fouadi, Dhia H. Hussain , " Preparation and study of Cu2O thin film at low temperature by Chemical vapor deposition (CVD) route " , International Journal of Application or Innovation in Engineering & Management (IJAIEM), Volume 4, Issue 12, December 2015 , pp. 063-066 , ISSN 2319 - 4847.
Full Text [PDF]                          Home